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Negative photo resist

8. AR 300-80 and HMDS adhesion promoter
ㆍ  Adhesion Promoter
ㆍ  AR 300-80: spin coating 방식으로 도포
ㆍ  HMDS: 전용 설비 필요
AR 300-80, HMDS, adhesion promoter
Characterisation
Properties
  - Improvement of the adhesive strength of photo and e-beam
    resist films
  - Especially for surfaces with low adhesion properties, e.g. metal,
    SiO2, GaAs
  - AR 300-80: spin coating of a diphenylsilanediol solution = 
    improved adhesion properties and simple, cheaper alternative to
    HDMS

  - HMDS: evaporation of HMDS on the substrate surface
    (equipment required)
 Parameter /AR 300-80 HMDS
 Density at 20 °C (g/cm3) 0.971 0.774
 Storage 6 month (°C) 10 - 22

                                     
Processing information AR 300-80
Processing information HMDS
  - AR 300-80 is applied by spin coating between 1000 and 6000
    rpm. The film thickness can be adjusted by varying the spin
    speed to the optimum conditions of the respective process.
  - Higher spin speeds and thus thinner films are preferable, e.g.
    4000 rpm with approx. 15 nm thickness.
    Too high concentrations (film thickness values) may reduce or
    neutralise the adhesion-promoting effect.
  - It is recommended to perform the subsequent tempering on a
    hot plate for 2 min or in a convection oven for 25 min at 180 °C.
    During tempering, a very uniform, extremely thin layer of
    adhesion promoter is generated on the substrate
   (approx. 15 nm).
  - After cooling of the substrate, the resist can be applied as usual.
  - An excess of adhesion promoter may be rinsed off with organic
    solvents like e.g. AR 600-70 or AR 600-71. The optimised
    surface properties are maintained without restriction.
  - Appropriate equipment is required for the processing of HMDS.
    For large scale production, hot plates with HMDS vapor
    deposition are used. If no such equipment is available, the
    following procedure should be applied:
  - The pre-treatment should be performed immediately prior to
    resist coating. Generally, hot plates with integrated HMDS-
    evaporation are used in the production. If this option is not
    available, the substrate is placed in a desiccator where HMDS
    evaporates at room temperature or at temperatures up to
    160 °C max. HMDS is under these conditions deposited as
    monomolecular layer (approx. 5 nm) on the substrate surface.
  - The treated substrate can be coated with resist immediately
    after HMDS-deposition without subsequent tempering,or stored
    in a closed container for a couple of days.
  - The storage stability may be limited due to an uptake of water
    from the atmosphere. Storage in open containers should thus
    be avoided.