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Negative photo resist

3. APOL-LO 3200 Lift Off Photo Resist
ㆍ  Negative photo resist Lift-off profile
ㆍ  Thickness: 2 μm - 10 μm
Exposure: i-line and broadband
ㆍ  Application: Compound Semiconductors (CS), LEDs, RF, VCSEL
ㆍ  저렴한 가격. 0.5 L, 1 L, 4 L 이외 용량 선택 가능
ㆍ  납기일: 3~5주 (평균 납기일: 24일, 2018년 납품 기준)
APOL-LO 3200 Lift-Off Negative Photo Resist
Description
Properties
 - APOL-LO 3200 Series Resist is a negative tone Advanced
   Photoresist with Lift-Off profile for i-Line, and broadband
   applications.
 - Application: Compound Semiconductors (CS), LEDs, RF, VCSEL.		 - Improved resolution and Wider process window.
 - Film Thickness range 2 – 10+ μm.
 - Designed for use with industry standard TMAH developers.
 - Customization available to: Adjust Lift-Off Angle and
   PhotoSpeed.

APOL-LO 3200 Series Spin Curve
APOL-LO 3200 Series Film Thickness Ragne
 APOL-LO-3200 Negative Photo Resist with Lift-Off Profiles. Spin curve.
ProductmicronsApp. Viscosity (cst)
APOL-LO 32022 - 425
APOL-LO 32043 - 667
APOL-LO 32075 - 10+180

APOL-LO 3200 Series: Lift Off Process Guide
Product: APOL-LO
Film Thickness		3202
2 μm		3204
4 μm		3204 and 3207
6 μm		3207
10 μm
Soft bake110 °C for 60 sec110 °C for 60 sec110 °C for 60 sec110 °C for 90 sec
Expose (broadband) on Si140 mJ/cm2145 mJ/cm2150 mJ/cm2200 mJ/cm2
Post Exposure Bake110 °C for 60 sec110 °C for 60 sec110 °C for 90 sec110 °C for 90 sec
Develop (TMAH 0.26N)40 sec 60 sec75 sec120 sec

Stepper and Broadband Performance
Stepper Performance
APOL-LO 3202
Film Thickness: 2.2 μm
Exposure: Nikno i9c stepper
APOL-LO-3202 Negative Photo Resist with Lift-Off Profiles. Resolution 1.0 micron at fim thickness 2.2 micron by stepper.
    Resolution: 1 μm
APOL-LO-3202 Negative Photo Resist with Lift-Off Profiles. Resolution 0.8 micron at fim thickness 2.2 micron by stepper.
Resolution: 0.8 μm
APOL-LO-3202 Negative Photo Resist with Lift-Off Profiles. Resolution 0.7 micron at fim thickness 2.2 micron by stepper.
Resolution: 0.7 μm
APOL-LO-3202 Negative Photo Resist with Lift-Off Profiles. Resolution 0.6 micron at fim thickness 2.2 micron by stepper.
Resolution: 0.6 μm
       
Broadband Performance
APOL-LO 3207
Film Thickness: 6 μm FT
Exposure: Broadband
APOL-LO-3202 Negative Photo Resist with Lift-Off Profiles. Line and space 5 micron at fim thickness 6 micron by broadband.
5 μm l/s
APOL-LO-3202 Negative Photo Resist with Lift-Off Profiles. Line and space 4 micron at fim thickness 6 micron by broadband..
4 μm l/s
APOL-LO-3202 Negative Photo Resist with Lift-Off Profiles. Line and space 3 micron at fim thickness 6 micron by broadband.
    3 μm l/s

APOL LO 3200 Stepper Through Focus Profile
APOL-LO-3200 Negative Photo Resist. Through Focus Profile by stepper.
Related Products (Guide for Kemlab Photoresists)
Product Suite
Tone / Exposure
Product
Film Thickness (μm)
0.2 0.5 0.8 1 1.3 2 2.5 3 4 5 6 7 8 9 10 20 30 40 50 100
KL 5302 Hi-Res
Interference Lithography (Link)		 Positive
i-Line, Broadband, g-line		 KL 5302 Hi-Res                                        
                                       
KL 5300
General Purpose
(Link)		 Positive
i-Line, Broadband, g-line		 KL 5302                                        
KL 5305                                        
KL 5310                                        
KL 5315                                        
KL 6000
General Purpose Thick
(Link)		 Positive
i-Line, Broadband, g-line		 KL 6003                                        
KL 6005                                        
KL 6008                                        
K-PRO
Packaging Resist (Link)		 Positive
i-Line, Broadband, g-line		 K-PRO 7                                        
K-PRO 715                                        
                                                                                                                                                                             
Product Suite
Tone / Exposure
Product
Film Thickness (μm)
0.2 0.5 0.8 1 1.3 2 2.5 3 4 5 6 7 8 9 10 20 30 40 50 100
HARE SQ
Negative Epoxy
(Link)		 Negative
Epoxy Resist
i-Line, Broadband
MEMS, Microfluidics		 SQ 2                                        
SQ 5                                        
SQ 10                                        
SQ 25                                        
SQ 50                                        
KL Image Reversal
Lift Off (Link)		 Positive / Negative
i-Line, Broadband, g-line		 KL IR-15 Lift Off                                        
KL IR-15                                        
APOL-LO 3200
Negative Lift Off
(Link)		 Negative
i-Line, Broadband		 APOL-LO 3202                                        
APOL-LO 3204                                        
APOL-LO 3207