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Negative photo resist

4. KL NPR - Vertical Profile Photo Resist
ㆍ  Negative photo resist with Vertical profile
ㆍ  Thickness: about 2.5 μm - 20 μm
Exposure: i-line and broadband
ㆍ  저렴한 가격. 0.5 L, 1 L, 4 L 이외 용량 선택 가능
ㆍ  납기일: 3~5주
KL NPR - Vertical Profile Negative Photo Resist
Description
Properties
 - KL NPR is a negative tone, novolac photoresist designed for
  eletroplating, metal deposition, TSV, and RIE etch.
 - Vertical Profile and high aspect ratios.
 - Thick vertical porfile (straight wall).
 - Film Thickness range 2.5 – 20 μm.
 - Designed for use with industry standard TMAH, KOH developers.
 - A possible customizing to thickness.

KL NPR Spin Curve
Processing Guidelines
KL NPR Negative Photo Resist with Vertical Profiles Spin curve.
       
NPR 4
  (FT: 4 μm)
NPR 6
  (FT: 6 μm)
NPR 10
  (FT: 10 μm)
Spin coat45 sec
@ 2000 RPM
45 sec
@ 2000 RPM
45 sec
@ 2000 RPM
Soft bake90 sec
@ 110 ⁰C
90 sec
@ 110 ⁰C
120 sec
@ 110 ⁰C
Exposure
(Broadband
on Si)
80 mJ/cm275 mJ/cm275 mJ/cm2
PEB90 sec
@ 110 ⁰C
90 sec
@ 110 ⁰C
120 sec
@ 110 ⁰C
Development
(0.26N TMAH)
50 sec60 sec90 sec

Process results
10um posts in 25um film thickness
10 μm posts in 25 μm film thickness
15um line and space in 25um film thickness
15 μm line and space in 25 μm film thickness
5um post on Si substrate
5 μm posts on Si substrate
7um line and space on Cu substrate
7 μm line and space on Cu substrate
Related Products (Guide for Kemlab Photoresists)
Product Suite
Tone / Exposure
Product
Film Thickness (μm)
0.2 0.5 0.8 1 1.3 2 2.5 3 4 5 6 7 8 9 10 20 30 40 50 100
KL 5302 Hi-Res
Interference Lithography (Link)
Positive
i-Line, Broadband, g-line
KL 5302 Hi-Res                                        
                                       
KL 5300
General Purpose
(Link)
Positive
i-Line, Broadband, g-line
KL 5302                                        
KL 5305                                        
KL 5310                                        
KL 5315                                        
KL 6000
General Purpose Thick
(Link)
Positive
i-Line, Broadband, g-line
KL 6003                                        
KL 6005                                        
KL 6008                                        
K-PRO
Packaging Resist (Link)
Positive
i-Line, Broadband, g-line
K-PRO 7                                        
K-PRO 715                                        
                                                                                                                                                                             
Product Suite
Tone / Exposure
Product
Film Thickness (μm)
0.2 0.5 0.8 1 1.3 2 2.5 3 4 5 6 7 8 9 10 20 30 40 50 100
HARE SQ
Negative Epoxy
(Link)
Negative
Epoxy Resist
i-Line, Broadband
MEMS, Microfluidics
SQ 2                                        
SQ 5                                        
SQ 10                                        
SQ 25                                        
SQ 50                                        
KL Image Reversal
Lift Off (Link)
Positive / Negative
i-Line, Broadband, g-line
KL IR-15 Lift Off                                        
KL IR-15                                        
APOL-LO 3200
Negative Lift Off
(Link)
Negative
i-Line, Broadband
APOL-LO 3202                                        
APOL-LO 3204                                        
APOL-LO 3207