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  • E-beam resist
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Photo resist

1. HARE SQ Developer
ㆍ  Developer of HARE SQ series (SU-8 epoxy photoresist).
ㆍ  판매 용량: 1 L, 4 L, 16 L 이외.
HARE SQ Photoresist Developer
 
Description
 
Advantages
 
 HARE SQ Series Developer is a solvent-based developer solution designed to cleanly develop SQ Series SU-8 epoxy photoresists, leaving vertical profiles with no Line Edge Roughness (LER).
 KemLab developer is fully compatible with other lithographic epoxies such as SU-8. HARE SQ Series developer uses only electronic grade materials that are common to the microelectronics industry.		 - Clean develop of SU-8 functional polymer photoresists.
 - Vertical Sidewall with no LER.
 - Direct replacement for SU-8 PGMEA developer.

Processing Guidelines
Resist Film ThicknessDevelop (immersion)# Baths / Puddles
< 2 μm30 sec1
2 μm1 min1
5 μm1 min1
10 μm2.5 min1
25 μm3.5 min1
50 μm6 min2
100 μm15 min2
200 μm25 min3