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Negative photo resist

3. HARE SQ MicroCoat - Negative Epoxy Photoresist for Thin Film
ㆍ  Negative Epoxy Photoresist for Thin Film and Surface Protection
ㆍ  SU-8 공정과 호환
Thickness: 0.05 μm - 2.5 μm
ㆍ  Application: MEMS, Microfluidics, Sensors, Pixel arrays
ㆍ  저렴한 가격. 0.5 L, 1 L, 4 L 이외 용량 선택 가능
ㆍ  납기일: 3 ~ 5주 내외
HARE SQ MicroCoat - Negative Epoxy Photoresist for Thin Film and Surface Protection
Description
Advantages
  KemLab HARE SQ MicroCoat resists are epoxy-based negative photoresists designed for thin films, high temperatures and severe chemical applications.

 HARE SQ MicroCoat is designed for use in thin films ranging from 0.05 - 2.0 µm and are often used in permanent device applications.

 Ultra-thin coatings of 50 nm fully cross-linked are achievable and used for imaged surface protection.		 - HARE SQ photoresists use an epoxy resin with superior   cleanliness and excellent lithographic.
 - Minimal film loss.
  - Fully crosslinked at 0.05 µm.
 - Short bake times for higher throughput.
 - Consistent surface energy of crosslinked resist.

 Tone:                Negative Photoresist
 Film Thickness: ~ 0.05 - 2.5 µm
 Sensitivity:       NUV, Broadband, i-line
                         (possible e-beam lithography)
 Developer:       HARE SQ Developer, PGMEA

HARE SQ MicroCoat Spin Curve Thin
HARE SQ MicroCoat Spin Curve
HARE_SQ_MicroCoat_Spin_Curve_Thin_RS.png
HARE_SQ_MicroCoat_Spin_Curve_RS.png

Process Guide
Product:
Film thickness
(@ 2000 RPM):		HARE SQ MicroCoat 0.05
  0.05 μm		HARE SQ MicroCoat 0.10
0.10 μm		HARE SQ MicroCoat 0.25
0.25 μm		HARE SQ MicroCoat 0.50
0.50 μm		HARE SQ MicroCoat 1.0
  1.0 μm		HARE SQ MicroCoat 2.0
  2.0 μm
Softbake95 °C for 1 min95 °C for 1 min95 °C for 1 min95 °C for 1 min95 °C for 2 min95 °C for 2 min
Expose (broadband on Si)300 mJ/cm2210 mJ/cm270 mJ/cm260 mJ/cm250 mJ/cm240 mJ/cm2
Post Exposure Bake (PEB)95 °C for 2 min95 °C for 2 min95 °C for 1 min95 °C for 1 min95 °C for 1 min95 °C for 1 min
Develop (immersion)30 seconds30 seconds30 seconds30 seconds30 seconds30 seconds

EXPOSURE & OPTICAL PARAMETERS
HARE_SQ_MicroCoat_Absorbance_Curve_RS.png
HARE_SQ_MicroCoat_Optical_Transmission_RS.png

Process results
HARE_SQ_MicroCoat_2_to_4_um_line_and_space_in_0.5_um_film.jpg
2 - 4 μm line/space in 0.5 μm film 1:1
HARE_SQ_MicroCoat_line_and_space.jpg
2 - 3 μm dense line/space in 1 μm film 1:1 by Contact alinger exposure
HARE_SQ_MicroCoat_1_RS.png
HARE_SQ_MicroCoat_2_RS.png
Products Guide
Tone
Product (link)
Film Thickness (µm)
Feature
Adhesion Promoter SurPass NA Apply resist: Novolac, DNQ, PMMA, HSQ, PMGI, SU-8, SML, PI, ...
Negative HARE SQ series 2 – 100 and 200* Epoxy.
SQ QuickDry series 2 – 200 Epoxy, Quick drying solvent.
SQ MicroCoat series 0.05 – 2 Epoxy, Thin film, Surface protection.
SQ OptiCoat series 2 – 100 Epoxy, Higher transparency.
APOL-LO 3200 series 2 – 10+ Lift-off profile.
KL NPR series 1 – 20 Vertical profile.
Image Reversal KL IR 15,
KL IR Lift-Off 15		 1.2 – 2.6 Lift-off profile (negative),
Vertical profile (negative).
Positive KL 7000 series 0.15 – 3 High resolution, No PFAS and Fluorine.
KL 6000 series 2.5 – 11 General thick purpose.
K-PRO series 0.8 – 25 and 50* Plating and etch application.
Advanced packaging
Protective Surface Coating PSC-1003 2.4 – 5.3 Protective Surface Coating
PSC-IB DPM 1010 10 (@ 2000 RPM) Protective Surface Coating
* Double coating.